We have explored the impact of the incorporation of nanoporous carbons as additives to tungsten oxide on the photocatalytic degradation of two recalcitrant pollutants: rhodamine B (RhB) and phenol, under simulated solar light. For this purpose, WO3/ carbon mixtures were prepared using three carbon materials with different properties (in terms of porosity, structural order and surface chemistry). Despite the low carbon content used (2 wt.%), a signi cant increase in the photocatalytic performance of the semiconductor was observed for all the catalysts. Moreover, the in uence of the carbon additive on the performance of the photocatalysts was found to be very different for the two pollutants. Carbon additives of hydrophobic nature increased the photodegradation yield of phenol compared to bare WO3, likely due to the higher af nity and stronger interactions of phenol molecules toward basic nanoporous carbons. Oppositely, the use of acidic carbon additives led to higher RhB conversions due to increased acidity of the WO3/carbon mixtures and the stronger af nity of the pollutant for acidic catalyst’s surfaces. As a result, the photooxidation of RhB is favored by means of a coupled (pho- tosensitized and photocatalytic) degradation mechanism. All these results highlight the importance of favoring the interactions of the pollutant with the catalyst’s surface through a detailed design of the features of the photocatalyst.
Carbon Materials as Additives to WO3 for an Enhanced Conversion of Simulated Solar Light
LAURENTI, Enzo;MAURINO, Valter;
2016-01-01
Abstract
We have explored the impact of the incorporation of nanoporous carbons as additives to tungsten oxide on the photocatalytic degradation of two recalcitrant pollutants: rhodamine B (RhB) and phenol, under simulated solar light. For this purpose, WO3/ carbon mixtures were prepared using three carbon materials with different properties (in terms of porosity, structural order and surface chemistry). Despite the low carbon content used (2 wt.%), a signi cant increase in the photocatalytic performance of the semiconductor was observed for all the catalysts. Moreover, the in uence of the carbon additive on the performance of the photocatalysts was found to be very different for the two pollutants. Carbon additives of hydrophobic nature increased the photodegradation yield of phenol compared to bare WO3, likely due to the higher af nity and stronger interactions of phenol molecules toward basic nanoporous carbons. Oppositely, the use of acidic carbon additives led to higher RhB conversions due to increased acidity of the WO3/carbon mixtures and the stronger af nity of the pollutant for acidic catalyst’s surfaces. As a result, the photooxidation of RhB is favored by means of a coupled (pho- tosensitized and photocatalytic) degradation mechanism. All these results highlight the importance of favoring the interactions of the pollutant with the catalyst’s surface through a detailed design of the features of the photocatalyst.File | Dimensione | Formato | |
---|---|---|---|
2016 Frontiers Research 3 (2016) 1-11.pdf
Accesso aperto
Descrizione: Articolo completo
Tipo di file:
PDF EDITORIALE
Dimensione
2.13 MB
Formato
Adobe PDF
|
2.13 MB | Adobe PDF | Visualizza/Apri |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.