We describe the first use of a novel photoresistfree X-ray nanopatterning technique to fabricate an electronic device. We have produced a proof-of-concept device consisting of a few Josephson junctions by irradiating microcrystals of theBi2Sr2CaCu2O8+δ (Bi-2212) superconducting oxide with a 17.6 keV synchrotron nanobeam. Fully functional devices have been obtained by locally turning the material into anonsuperconducting state by means of hard X-ray exposure. Nano-XRD patterns reveal that the crystallinity is substantially preserved in the irradiated areas that there is no evidence of macroscopic crystal disruption. Indications are that O ions have been removed from the crystals, which could make this technique interesting also for other oxide materials. Direct-write X-ray nanopatterning represents a promising fabrication methodexploiting material/material rather than vacuum/material interfaces, with the potential for nanometric resolution, improved mechanical stability, enhanced depth of patterning, and absence of chemical contamination with respect to traditional lithographic techniques.

Direct-Write X-ray Nanopatterning: A Proof of Concept Josephson Device on Bi2Sr2CaCu2O8+δ Superconducting Oxide

TRUCCATO, Marco;AGOSTINO, Angelo;BORFECCHIA, ELISA;MINO, LORENZO;PAGLIERO, ALESSANDRO;PASCALE, LISE;OPERTI, Lorenza;LAMBERTI, Carlo
2016

Abstract

We describe the first use of a novel photoresistfree X-ray nanopatterning technique to fabricate an electronic device. We have produced a proof-of-concept device consisting of a few Josephson junctions by irradiating microcrystals of theBi2Sr2CaCu2O8+δ (Bi-2212) superconducting oxide with a 17.6 keV synchrotron nanobeam. Fully functional devices have been obtained by locally turning the material into anonsuperconducting state by means of hard X-ray exposure. Nano-XRD patterns reveal that the crystallinity is substantially preserved in the irradiated areas that there is no evidence of macroscopic crystal disruption. Indications are that O ions have been removed from the crystals, which could make this technique interesting also for other oxide materials. Direct-write X-ray nanopatterning represents a promising fabrication methodexploiting material/material rather than vacuum/material interfaces, with the potential for nanometric resolution, improved mechanical stability, enhanced depth of patterning, and absence of chemical contamination with respect to traditional lithographic techniques.
16
3
1669
1674
http://pubs.acs.org/journal/nalefd
Bi-2212; high-temperature superconductors (HTSC); intrinsic Josephson junctions; nanopatterning; synchrotron radiation; X-ray nanoprobe;
Truccato, Marco; Agostino, Angelo; Borfecchia, Elisa; Mino, Lorenzo; Cara, Eleonora; Pagliero, Alessandro; Adhlakha, Nidhi; Pascale, Lise; Operti, Lorenza; Enrico, Emanuele; De Leo, Natascia; Fretto, Matteo; Martinez-Criado, Gema; Lamberti, Carlo
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/2318/1559295
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