The enhancement of photoelectrochemical conversion efficiency of p-type dye-sensitized solar cells (p-DSSCs) is necessary to build up effective tandem devices in which both anode and cathode are photoactive. The efficiency of a p-type device (2.5%) is roughly one order of magnitude lower than the n-type counterparts (13.1%), thus limiting the overall efficiency of the tandem cell, especially in terms of powered current density. This is mainly due to the recombination reaction that occurs especially at the photocathode (or Indium-doped Tin Oxide (ITO))/electrolyte interface. To minimize this phenomenon, a widely employed strategy is to deposit a compact film of NiO (acting as a blocking electrode) beneath the porous electrode. Here, we propose electrodeposition as a cheap, easy scalable and environmental-friendly approach to deposit nanometric films directly on ITO glass. The results are compared to a blocking layer made by means of sol-gel technique. Cells embodying a blocking layer substantially outperformed the reference device. Among them, BL_1.10V shows the best photoconversion efficiency (0.166%) and one of the highest values of fill factor (approaching 46%) ever reported. This is mainly due to an optimized surface roughness of the blocking layer assuring a good deposition of the porous layer. The effectiveness of the implementation of the blocking layer is further proved by means of Electrochemical Impedance Spectroscopy.

Electrochemically deposited NiO films as a blocking layer in p‐type dye‐sensitized solar cells with an impressive 45% fill factor

Bonomo M.;
2020-01-01

Abstract

The enhancement of photoelectrochemical conversion efficiency of p-type dye-sensitized solar cells (p-DSSCs) is necessary to build up effective tandem devices in which both anode and cathode are photoactive. The efficiency of a p-type device (2.5%) is roughly one order of magnitude lower than the n-type counterparts (13.1%), thus limiting the overall efficiency of the tandem cell, especially in terms of powered current density. This is mainly due to the recombination reaction that occurs especially at the photocathode (or Indium-doped Tin Oxide (ITO))/electrolyte interface. To minimize this phenomenon, a widely employed strategy is to deposit a compact film of NiO (acting as a blocking electrode) beneath the porous electrode. Here, we propose electrodeposition as a cheap, easy scalable and environmental-friendly approach to deposit nanometric films directly on ITO glass. The results are compared to a blocking layer made by means of sol-gel technique. Cells embodying a blocking layer substantially outperformed the reference device. Among them, BL_1.10V shows the best photoconversion efficiency (0.166%) and one of the highest values of fill factor (approaching 46%) ever reported. This is mainly due to an optimized surface roughness of the blocking layer assuring a good deposition of the porous layer. The effectiveness of the implementation of the blocking layer is further proved by means of Electrochemical Impedance Spectroscopy.
2020
Energy and Catalysis
MDPI AG
10
1
13
Blocking layer; Electro-deposition; Optimized fill factor; P-type DSSC; Recombination reactions
Bonomo M.; Di Girolamo D.; Piccinni M.; Dowling D.P.; Dini D.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2318/1757822
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