The main feature of amorphous materials is the presence of excess vibrational modes at low energies, giving rise to the so-called “boson peak” in neutron and optical spectroscopies. These same modes manifest themselves as two-level systems (TLSs) causing noise and decoherence in qubits and other sensitive devices. Here, we present an experiment that uses the spin relaxation of dangling bonds at the Si/(amorphous)SiO2 interface as a probe of TLSs. We introduce a model that is able to explain the observed nonexponential electron spin inversion recovery and provides a measure of the degree of spatial localization and concentration of the TLSs close to the interface, their maximum energy, and its temperature dependence.

Probing two-level systems with electron spin inversion recovery of defects at the Si/SiO2 interface

Fanciulli, M.
Membro del Collaboration Group
;
2020-01-01

Abstract

The main feature of amorphous materials is the presence of excess vibrational modes at low energies, giving rise to the so-called “boson peak” in neutron and optical spectroscopies. These same modes manifest themselves as two-level systems (TLSs) causing noise and decoherence in qubits and other sensitive devices. Here, we present an experiment that uses the spin relaxation of dangling bonds at the Si/(amorphous)SiO2 interface as a probe of TLSs. We introduce a model that is able to explain the observed nonexponential electron spin inversion recovery and provides a measure of the degree of spatial localization and concentration of the TLSs close to the interface, their maximum energy, and its temperature dependence.
2020
2
3
033507-1
033507-5
Two-level systems; Spin resonance; silicon; siliconoxide; interface; nanowires
Belli, M.; Fanciulli, M.; de Sousa, R.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2318/2076535
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