The high-bias electrical characteristics of back-gated field-effect transistors with chemical vapor deposition synthesized bilayer MoS2 channel and Ti Schottky contacts are discussed. It is found that oxidized Ti contacts on MoS2 form rectifying junctions with ≈0.3 to 0.5 eV Schottky barrier height. To explain the rectifying output characteristics of the transistors, a model is proposed based on two slightly asymmetric back-to-back Schottky barriers, where the highest current arises from image force barrier lowering at the electrically forced junction, while the reverse current is due to Schottky-barrier-limited injection at the grounded junction. The device achieves a photoresponsivity greater than 2.5 A W−1 under 5 mW cm−2 white-LED light. By comparing two- and four-probe measurements, it is demonstrated that the hysteresis and persistent photoconductivity exhibited by the transistor are peculiarities of the MoS2 channel rather than effects of the Ti/MoS2 interface.

Asymmetric Schottky Contacts in Bilayer MoS2 Field Effect Transistors

Urban, Francesca;
2018-01-01

Abstract

The high-bias electrical characteristics of back-gated field-effect transistors with chemical vapor deposition synthesized bilayer MoS2 channel and Ti Schottky contacts are discussed. It is found that oxidized Ti contacts on MoS2 form rectifying junctions with ≈0.3 to 0.5 eV Schottky barrier height. To explain the rectifying output characteristics of the transistors, a model is proposed based on two slightly asymmetric back-to-back Schottky barriers, where the highest current arises from image force barrier lowering at the electrically forced junction, while the reverse current is due to Schottky-barrier-limited injection at the grounded junction. The device achieves a photoresponsivity greater than 2.5 A W−1 under 5 mW cm−2 white-LED light. By comparing two- and four-probe measurements, it is demonstrated that the hysteresis and persistent photoconductivity exhibited by the transistor are peculiarities of the MoS2 channel rather than effects of the Ti/MoS2 interface.
2018
28
28
1
10
2D materials; barrier lowering; photodetectors; Schottky contacts; transistors
Di Bartolomeo, Antonio; Grillo, Alessandro; Urban, Francesca; Iemmo, Laura; Giubileo, Filippo; Luongo, Giuseppe; Amato, Giampiero; Croin, Luca; Sun, L...espandi
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2318/2130713
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