The gas-phase ion chemistry of NF3/SO2 mixtures has been investigated by ion trap mass spectrometry and theoretical calculations. SO+ and SO2 + react efficiently with NF3 giving F (SO)+ and F (SO2)+. CAD experiments and thermochemical considerations support the exclusive formation of the sulfur–fluorine cations F SO+ and F SO2 +. NF2 + is unreactive toward SO2, and NF3 + undergoes exclusively the efficient charge transfer. On the other hand, NF+ activates the OS O bond, with formation of SO+ and NO+. DFT and coupled cluster calculations indicate that these ionic products arise from a SO+–(FNO) ion–dipole complex, which dissociates into SO+ and FNO or NO+ and FSO. This intermediate is more stable than NF+ and SO2 by nearly 60 kcal mol−1. We have also located a less stable sulfur–nitrogen complex FN SO2 +, whose formation explains the less efficient observed charge transfer between NF+ and SO2. The only observed negative ion–molecule reaction is the formation of F SO2− from the reaction between SO2− and NF3. Our investigated processes may be of interest for the plasma and the atmospheric chemistry of NF3, one of the gaseous compounds most extensively used in the electronic industry to perform etching and cleaning processes.

Gas-phase ion chemistry of NF3/SO2 mixtures: A mass spectrometric and theoretical investigation

ANTONIOTTI, Paola;RABEZZANA, Roberto;TURCO, Francesca;
2007-01-01

Abstract

The gas-phase ion chemistry of NF3/SO2 mixtures has been investigated by ion trap mass spectrometry and theoretical calculations. SO+ and SO2 + react efficiently with NF3 giving F (SO)+ and F (SO2)+. CAD experiments and thermochemical considerations support the exclusive formation of the sulfur–fluorine cations F SO+ and F SO2 +. NF2 + is unreactive toward SO2, and NF3 + undergoes exclusively the efficient charge transfer. On the other hand, NF+ activates the OS O bond, with formation of SO+ and NO+. DFT and coupled cluster calculations indicate that these ionic products arise from a SO+–(FNO) ion–dipole complex, which dissociates into SO+ and FNO or NO+ and FSO. This intermediate is more stable than NF+ and SO2 by nearly 60 kcal mol−1. We have also located a less stable sulfur–nitrogen complex FN SO2 +, whose formation explains the less efficient observed charge transfer between NF+ and SO2. The only observed negative ion–molecule reaction is the formation of F SO2− from the reaction between SO2− and NF3. Our investigated processes may be of interest for the plasma and the atmospheric chemistry of NF3, one of the gaseous compounds most extensively used in the electronic industry to perform etching and cleaning processes.
2007
266(1-3)
86
91
Ion trap mass spectrometry; Nitrogen trifluoride; Sulfur dioxide; Sulfur oxyfluorine ion; Theoretical calculation
P. ANTONIOTTI; R. RABEZZANA; F. TURCO; S. BOROCCI; N. BRONZOLINO; F. GRANDINETTI
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2318/39364
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